Assembled Dual Seal.
Optimal Solution for Controlling Contamination Defects in Semiconductor Wafers
Product Introduction
Assembled Dual Seal.
Assembled Dual Seal.
In the semiconductor industry, where no impurity can be tolerated, addressing contamination defects that occur after the CMP process is crucial for yield improvement. At the heart of this solution is the functional PURIENCE PVA Brush.
Product Brochure
Assembled Dual Seal (ADS)
Combines the advantages of traditional O-Ring Seals and Metal Seals to form an Assembled Dual Seal
Designed to retain the robustness of conventional external Metal Seals
Excellent leak prevention with a dual sealing structure of Metal Seal and FKM
No outgassing compared to FKM or FFKM
Higher operating temperature when using Ni
Lower maintenance cost compared to FFKM
No rejection issues due to O-Ring usage